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Sheet resistance for thin films measurement using Microwave Frequency Q-Meter
with Split Post Dielectric Resonator (SPDR) and Single Post Dielectric Resonator (SiPDR).
Use of inexpensive computer controlled microwave oscillator system, Microwave Frequency Q-Meter, enabling quick and automatic measurements of permittivity, dielectric loss tangent and resistivity with a dedicated SPDR or resistivity and sheet resistance with a dedicated SiPDR.
To determine sheet resistance, only two measurements should be performed. The first one, called reference measurements, is performed for resonator containing blank substrate. The second one - for resonator containing test sample.
The second one is performed for resonator containing test sample. In case of measurements of thin films deposited on a semi-insulating substrate samples must be placed in resonator with thin film facing down - towards dielectric resonator. It should be noted that samples under test must be very flat and not bended. It is very important to make sure that the surface of the sample lays exactly on the surface of the aluminium surface of the resonator. Presence of any dust particles between the sample and the aluminium surface should be avoided.
The 'Thin film' option should be checked.
Range of sheet resistance measurements for the SiPDR: 0.1Ω - 10kΩ.
The measured sheet resistance will appear in the green column.
Microwave Frequency Q-Meter connected to the SiPDR and to the computer. Dedicated application allows controlling measurement process and enables easy management of the measurements results.
Microwave Frequency Q-Meter connected to the SPDR and to the computer. Dedicated application allows controlling measurement process and enables easy management of the measurements results.
Range of sheet resistance measurements for the SPDR: 4kΩ - 10MΩ.
SPDRs are intended for the measurements of the complex permittivity of laminar dielectric materials including LTCC substrates, but also thin ferroelectric films deposited on low loss dielectric substrates. Additionally, SPDRs can be used for the measurements of the surface resistance and conductivity of various conducting materials such as commercial resistive layers, thin conductive polymer films or high resistivity semiconductors. Such measurements are only possible for large surface resistance samples with Rs > 5 kΩ/square.
SiPDRs are intended for the measurements of the surface impedance of metamaterials and resistive films as well as for the contact-less measurements of the conductivity of semiconductor wafers. Range of thin film materials that can be measured includes resistive layers, thin metal films and conductive polymer films with the surface resistance Rs < 20 kΩ/square. For semiconductor wafers the upper limit for resistivity measurements is about 1000 Ωcm. Semiconductors with higher resistivity values can be conveniently measured with split post dielectric resonators.
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